1、

The mechanisms of dissolution inhibition of positive photoresist based on novolak ( NVK)-diazonaphthoquinone ( DNQ), including ( 1) the molecular hydrogen bonding interactions between novolak and DNQ;

本文综述了酚醛重氮萘醌正性抗蚀剂的溶解抑制机理,主要包括(1)分子间氢键作用机理;

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2、

Dissolution inhibition mechanisms of positive photoresist based on novolak-dnq

酚醛-重氮萘醌正性抗蚀剂溶解抑制机理

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3、

Via the reaction between sulphonyl chloride and amino group, photo-/ thermo-responsive microgels were prepared with different ratios of DNQ to amino groups.

通过苯磺酰氯与氨基之间的反应制备了含不同比例氨基和DNQ的光温双敏感微凝胶纳米粒子。

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