1、

Polishing surface with elastic laing tools have higher efficiency and quality than with ball end tools.

结果表明:用弹性浮动工具机械电解抛光平缓曲面具有加工效率高,质量好的优点.

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2、

This dual-function machine provides you the versatility of both ultrasonic and mechanical polishing.

超音波及电动手机双功率输出,提供您多重功能之各种研磨及抛光功能.

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3、

The working temperature was 45-50 oC, polishing duration was 15-18 minutes.

其工作温度45~50℃、抛光时间15~18min。

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4、

The influences of polishing to the gloss, DOI, color difference of top-coat of automobiles are introduced.

介绍了抛光对汽车面漆漆膜光泽、鲜映性、色差的影响。

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5、

A process for dyeing and finishing ramie/ cotton blend towel was set forward as: kier boiling in one bath, treatment with polishing enzyme, dyeing with reactive dyes and finally softening finishing.

苎麻/棉混纺毛巾经一浴法煮漂后,进行抛光酶处理,用活性染料染色,再进行柔软整理。

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6、

The content ( by vo lume) of the former should be ≤ 0.88% for ≤ 16% cobalt alloy. Those over 0.88% in the standard photograph are pseudoimages resulting from too large particle slie of abrasive materials during polishing.

含钴量≤16%的合金中,共晶石墨的体积含量应≤c.88%,标准照片中>0.88%的照片,是抛光时研磨料粒子太粗造成的假象;

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7、

The Chemical mechanical polishing technique in the field of semiconductor industry was introduced.

介绍了半导体工业中蓬勃发展的化学机械抛光(CMP)技术.

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8、

Finally, the development direction of polishing technology for CVD diamond thin film was forecasted.

并展望了CVD金刚石薄膜抛光技术的发展方向.

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9、

Finally, discussed are etching mechanism, polishing principles, and control of reactive versions of the InP material.

文章最后讨论了InP材料的腐蚀机理 、 抛光原理及化学反应类型的控制.

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10、

Magnetorheological jet polishing ( MJP ) is a new deterministic precision finishing technology.

磁射流抛光技术是一种新型的确定性精密抛光方法.

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11、

The effects on material removal of MJP Jet Polishing by several parameters were given.

研究了磁射流抛光时几种工艺参数对材料去除的影响.

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12、

He was busy polishing the pots and pans.

他正忙着擦拭锅盘.

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13、

Application of UFD on Polishing Surfaces with Sub nanometer Scale Roughness

应用纳米级金刚石抛光亚纳米级光滑表面

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14、

Direction: Daub the floor with it by a wax swob , and then scrub it by a polishing machine.

使用方法:用干净蜡拖,涂于地面并用抛光机抛光。

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15、

One of the branches of CCOS is the computer controlled small tool polishing.

计算机控制小工具抛光是其中的一个重要分支。

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16、

The optimum schemes in the polishing process of CCOS are discussed.

讨论了CCOS在抛光过程中的工艺技术优化方案;

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17、

However, the material can be improved, such as by cutting waste Zhukuai to fine polishing.

不过, 取材可以改良, 比如用废旧竹筷削细抛光即可.

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18、

Fabricating technology and characteristics of a new type Of WBN polishing pills

一种新型的固着磨料抛光片&WBN抛光片的制作工艺及其特性

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19、

We described in the paper a new type of polishing pill manufactured by using a rensentlysynthesized superhard ceramic powders of wurtzite-type boron nitride ( WBN).

本文描述了用冲击合成方法得到的超硬材料纤锌矿型氮化硼(WBN)制作的一种新型抛光片。

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20、

The influence of the pressure, rotate speed and polishing time on MRR is discussed in this paper.

本文讨论了硬盘片的化学机械抛光过程中的外加压力、转速和抛光时间对去除率的影响。

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