结果表明:用弹性浮动工具机械电解抛光平缓曲面具有加工效率高,质量好的优点.
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This dual-function machine provides you the versatility of both ultrasonic and mechanical polishing.
超音波及电动手机双功率输出,提供您多重功能之各种研磨及抛光功能.
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The working temperature was 45-50 oC, polishing duration was 15-18 minutes.
其工作温度45~50℃、抛光时间15~18min。
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介绍了抛光对汽车面漆漆膜光泽、鲜映性、色差的影响。
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含钴量≤16%的合金中,共晶石墨的体积含量应≤c.88%,标准照片中>0.88%的照片,是抛光时研磨料粒子太粗造成的假象;
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The Chemical mechanical polishing technique in the field of semiconductor industry was introduced.
介绍了半导体工业中蓬勃发展的化学机械抛光(CMP)技术.
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Finally, the development direction of polishing technology for CVD diamond thin film was forecasted.
并展望了CVD金刚石薄膜抛光技术的发展方向.
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文章最后讨论了InP材料的腐蚀机理 、 抛光原理及化学反应类型的控制.
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Magnetorheological jet polishing ( MJP ) is a new deterministic precision finishing technology.
磁射流抛光技术是一种新型的确定性精密抛光方法.
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The effects on material removal of MJP Jet Polishing by several parameters were given.
研究了磁射流抛光时几种工艺参数对材料去除的影响.
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Application of UFD on Polishing Surfaces with Sub nanometer Scale Roughness
应用纳米级金刚石抛光亚纳米级光滑表面
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Direction: Daub the floor with it by a wax swob , and then scrub it by a polishing machine.
使用方法:用干净蜡拖,涂于地面并用抛光机抛光。
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One of the branches of CCOS is the computer controlled small tool polishing.
计算机控制小工具抛光是其中的一个重要分支。
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However, the material can be improved, such as by cutting waste Zhukuai to fine polishing.
不过, 取材可以改良, 比如用废旧竹筷削细抛光即可.
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Fabricating technology and characteristics of a new type Of WBN polishing pills
一种新型的固着磨料抛光片&WBN抛光片的制作工艺及其特性
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本文描述了用冲击合成方法得到的超硬材料纤锌矿型氮化硼(WBN)制作的一种新型抛光片。
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The influence of the pressure, rotate speed and polishing time on MRR is discussed in this paper.
本文讨论了硬盘片的化学机械抛光过程中的外加压力、转速和抛光时间对去除率的影响。
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