1、

The base mould is slightly raised stempelsysteme copy in paper and stempelsysteme, Nano-imprint lithography version above.

底模是稍微凹下的印模复本, 不收于纸张和印模底下,起不抬印版的息用.

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2、

DY2001A Electron Beam Lithography System ( EBLS) is developed as a practical miniature EBLS.

DY2001A型电子束曝光机是作为实用化的小型曝光系统而研制的。

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3、

A printmaker who uses lithography.

使用平版印刷术的版画复制匠。

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4、

Beam blanker circuit for a electron-beam lithography system

SDS-2电子束曝光机束闸线路

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5、

In lithography the electronic circuit pattern is printed photographically on to a surface.

在光刻技术中,电子电路晶格被以类似于照相的方式压印在一个表面上。

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6、

The lithography and the manufacture technology are the lithograph most important art performance method.

石版印刷和制作技术是石版画最重要的艺术表现手段.

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7、

Durable , white, water-resistant, low shrinkage resin for stereo lithography for SLA system.

应用于立体光刻技术的耐久性, 白色, 防水和低收缩的树脂.

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8、

Another fast method of fabricating imprint stamp is using holographical lithography combined with ICP etching.

另外一种高效制备微纳米压印印章的方法是全息曝光结合感应耦合等离子体刻蚀(ICP)的方法。

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9、

The research results show that IIL can get the high resolution more effectively than conventional optical lithography ( OL).

研究结果表明,掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。

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10、

Imaging interferometric lithography ( IIL) uses multiple exposure to record different portions of the spatial frequency space of mask and greatly increases resolution.

成像干涉光刻技术(IIL)利用多次曝光分别记录物体空间频率的不同部分,极大地提高了成像质量,其中大角度倾斜照明是对OAI的扩展。

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11、

The vowelizing algorithm based on the principle of layering slicing was applied to transfer stereo lithography(STL)model into voxel model.

首先采用基于分层切片原理的体素化算法将STL网格模型转化为体素模型。

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12、

The design of a new kind of UV or DUV lithography lenses is described in this paper.

设计了一种新的紫外或深紫外光刻物镜。

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13、

Compared with other UV or DUV lithography lenses, this lens can meet the needs of higher numerical aperture and full use of its field.

该物镜与国内外现有的紫外或深紫外光刻物镜相比,既能满足大数值孔径的需要,又能充分利用物镜的视场。

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14、

Application of DUV deep lithography in LIGA process

深紫外深度光刻蚀在LIGA工艺中的应用

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15、

A real-time exposure dose control algorithm for DUV excimer lasers in a step and scan projection lithography is presented.

提出了一种面向步进扫描投影光刻机的深紫外准分子激光实时曝光剂量控制算法。

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16、

A process for printing from a smooth surface, as lithography offset.

照相(影印)平版印刷(法)根据摄影图像制作的,使用印版的平面印刷过程.

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17、

Synchrotron radiation scanning mirror control system for integrate circuit lithography

集成电路同步幅射光刻镜扫描控制系统

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18、

The new set of models are more proper for lithography simulation for thick SU-8 resist.

对于厚SU-8胶的模拟,这种模型比普通的模拟模型更加合适。

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19、

To improve the fabrication technology of photoelectrical encoder , the laser lithography method was introduced.

为了改进光电码盘的制作工艺,提高效率,降低成本,提出了一种光电码盘的光刻方法.

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20、

Imaging Interferometric Lithography ( IIL) has high resolution of interferometric lithography ( IL) and ability for printing arbitrary patterns of optical lithography ( OL).

成像干涉光刻技术(IIL)具有干涉光刻技术(IL)的高分辨力和光学光刻技术(OL)产生任意形状集成电路特征图形的能力。

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