1、

X ray lithography ( XRL) is a very important batch exposure technology in micro/ nanometer lithography. The development of XRL requires new X ray source, new type of stepper, new X ray masks and advanced related processing technology.

X-ray光刻(XRL)是微/纳米光刻技术中至关重要的批量复制技术,XRL的发展在于不断对X-ray源、新型的stepper、X线掩模版以及相关处理工艺的研究进展。

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2、

It is well known that optical limitation is the bottle neck in traditional lithography process.

由于传统的光刻生产工艺有透镜光学极限性,压印光刻为集成电路的生产提供了一种新思路.

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3、

Relative to the metal roller and plate cylinder, block drum and nano-imprint lithography drum case might.

不绝对于金属网纹辊与印版滚筒 、 印版滚筒与压印滚筒的不张辛而言可以不详不小些.

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4、

Electron-beam lithography with a novel multilevel resist structure defines the pattern.

采用新型的多层抗蚀剂结构的电子束光刻来形成图形.

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5、

This article mainly explains the process of LIGA technology, which includes X-ray lithography,-electroforming and-copy.

本文主要阐述了LIGA技术 的工艺过程, 包括 X 射线深层光刻 、 微电铸和微复制工艺.

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6、

A process of soft lithography was introduced for fabrication of PDMS ( polydimethylsiloxane ) micro-mixer on micro-fluidic chip.

介绍了一种用软光刻技术制作微流芯片上 PDMS 微混合器的工艺.

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7、

Choice criteria on target material for soft Xray projection lithography source were proposed in this paper.

给出了用于软X射线 投影光刻的激光等离子体源靶材的选择依据.

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8、

Solution: fine-tune gripper teeth pad with Nano-imprint lithography drum edge.

处置办法: 澈底调不静递纸牙牙垫同压印滚筒外的隔断.

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9、

Intel continues to use 193-nm dry lithography at 45 nm.

intel在45nm上仍然使用193nm波长的干式光刻.

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10、

The results show that the method is effective and antinoise in measuring the laser interference lithography patterns.

测量结果证明,对于激光干涉条纹图,该方法是一种有效的测量方法并且具有较高的抗噪声性能。

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11、

The company has Heidelberg Subaru four-color, color, offset lithography, double-sided printing presses, such as printing equipment.

公司拥有海德堡速霸四色 、 双色 、 平版胶印机 、 双面印刷机 、 等印刷设备.

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12、

Nano-imprint lithography drum paper teeth spring break.

压印滚筒咬纸牙撑簧不续裂.

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13、

Lithography technique has been the key point to push forward the USL fabricator. X-ray lithography ( XRL) is one of the next generation lithography techniques ( NGL), which has the probability of industrialization.

光刻技术是推动集成电路制造业不断向前发展的关键技术,X射线光刻技术是下一代光刻技术的一种,具有产业化的应用前景。

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14、

Individual sodium titanate nanowire-based device is fabricated via e-beam lithography techniques.

利用电子束光刻技术制作了基于钛酸钠纳米线的纳米器件.

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15、

The reduction of IC feature size constantly prompts the research and development of new lithography technique.

集成电路特征尺寸的缩小,不断促进新一代光刻技术的研究和开发.

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16、

Trends of Lithography Technology Based on Decreasing of the Feature Size

从特征尺寸的缩小看光刻技术的发展

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17、

Research on Backscattered Electron Detecting Circuit of Scanning-electron-beam Lithography System

电子束曝光机背散射电子检测电路的研究

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18、

Printing by lithography; a flat surface ( of stone or metal) is treated to absorb or repel ink in the desired pattern.

用平板印刷;用来吸收或分派墨汁使它们达到理想模式的光滑平面(石制的或铁制的)。

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20、

Blanket in Nano-imprint lithography procedure of periodic alternating stress of deformation.

橡皮布在不抬印历程洋,受到周期性接变答力的功用,爆发形变.

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