sputtering的例句大全

The Application and Process of Three Pole Reaction Sputtering for Superhard Film

三极反应溅射超硬镀层工艺及其应用

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Fabrication by sputtering process of high Tc thin films and their structural and superconducting properties

溅射法制备Y（Gd）Ba2Cu3O7高温超导薄膜工艺，膜的结构及超导性能研究

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Cr-Cu-N films were deposited using low energy ion beam assisted magnetron sputtering ( IBAMS). The effects of copper and bombardment energy on structure, hardness and fracture toughness of the films were studied.

应用低能离子束辅助磁控溅射（IBAMS）沉积铬-铜-氮薄膜，研究了铜含量和轰击能量对薄膜结构、硬度和断裂韧度的影响。

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Bonding of Target Material and Backing Plate for 9900 Sputtering System

9900型靶材与靶托的连接技术

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The influence of TiN thin flms grown processing by magnetron sputtering

磁控溅射制备TiN薄膜影响因素的研究

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The economy is already sputtering, with low or no growth...

经济发展速度已经放慢，增长率很低，或者根本没有增长。

《柯林斯高阶英汉双解学习词典》

Influence of Copper Sputtering on Thermal Stability of ZrN Diffusion Barrier

溅射Cu膜方式对ZrN扩散阻挡层热稳定性的影响

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The failure mechanisms of the RLG are very complex, but the cathode sputtering and the polluting of the reflector are the most important factors among them.

激光陀螺仪失效机理非常复杂，其中对寿命影响最为重要的因素是阴极溅射和反射镜的污染及损伤。

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Electric and infrared absorption properties of LNO thin films prepared by RF-magnetron sputtering

LNO薄膜的射频磁控溅射制备及其电学性能与红外吸收性能

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Development of an Apparatus on Magnetron Sputtering Deposition, JGP 600

JGP-600型磁控溅射薄膜沉积装置的研制

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Study of DLC films residual stress by unbalanced magnetron sputtering technology

非平衡磁控溅射DLC薄膜应力研究

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KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC.

中文关键词: 气离溅射 、 离子源 、 阳极层流 、 溅射 、 氮化钛 、 离子镀膜 、 中频 、 脉冲直流.

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For the as-deposited films, the sheet resistance is of inverse proportion function as the sputtering time.

溅射态合金薄膜方块电阻与溅射时间呈反比；

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KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC. Influences of solar flare bursts and partical precipitation on the lower ionosphere have been observed by means of VLF propagation effects at Zhongshan Station in Antarctica.

中文关键词：气离溅射、子源、极层流、射、化钛、子镀膜、频、冲直流。在南极中山站利用甚低频传播手段观测太阳耀斑爆发及极区粒子沉降对低电离层的影响。

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Kinetic Model for Gas Adsorption in Sputtering HCD Metal Ion Laser

溅射型HCD金属离子激光器的气体吸附动力学模型

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Calculations of sputtering yield of high Z materials target using a new local model

用新局域模型计算高Z靶的溅射产额

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Study of Magnetic Field Control Type ECR Sputtering Method Used Vaccum Waveguide

真空波导磁场控制型ECR溅射法的实验研究

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Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.

采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.

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In this paper, JGP 600 a new device of the magnetron sputtering deposition is introduced. The three magnetron sputtering target qualified to RF and DC is used;

本文介绍了一种新的JGP－600型磁控溅射沉积薄膜装置。

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Metal aluminum films were deposited on AAO templates by radio frequency magnetron sputtering.

用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜.

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