magnetron的例句大全

Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.

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Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.

利用低频反应磁控溅射制备五氧化二铌光学薄膜.

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The generator represents magnetron, packaged with constant magnets in ceramic-metal execution.

该磁控管采用金属陶瓷封装,装有永磁体.

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The kinetic process of reactive magnetron sputtering has been studied.

研究了反应磁控溅射的动力学过程.

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Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.

采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.

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Si rich SiO 2 films have been prepared by a rf magnetron sputter method.

用射频磁控溅射法制备了富硅二氧化硅薄膜.

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In the fourth chapter Sb-doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.

第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.

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Suitable for making heating element for electrical oven and magnetron.

适用于制作电气炉发热元件等.

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The generator represents magnetron , packaged with constants and electromagnets ( 2 coils magnetic ) in the magnetic-shielded ceramic-metal execution.

该磁控管的设计采用电磁石,封装采用金属陶瓷.

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The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.

利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.

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Methods: The nature HA films were prepared by electron beam evaporation and rf-magnetron sputtering techniques.

方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.

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Its principle and some other aredescribed, including the magnetron sputter coater and the osmium plasma coater.

本文将主要叙述等离子溅射镀膜的原理与方法,并且简单介绍磁控管溅射仪和锇等离子镀膜仪等.

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Ti-O film was prepared by microwave-electron convolute resonance ( MW-ECR ) magnetron filter arc deposition process.

采用微波电子回旋 共振 磁过滤弧设备制备钛氧薄膜.

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Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .

采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.

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Magnetron is often used as microwave power source in clinical linac magnetron.

在医用直线加速器中通常都采用磁控管作为微波功率源.

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Calculation and simulation analysis of A6 relativistic magnetron's resonated system

A6磁控管谐振系统的计算与模拟分析

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So, in this work , AlN thin films were prepared by RF magnetron sputtering deposition method.

所以本文利用射频磁控溅射方法制备AlN薄膜.

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TiB _ 2 and Ti-B-N coatings were prepared by magnetron sputtering on 1 Cr 18 Ni 9 Ti stainless steel.

用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和 Ti -B-N涂层.

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Fused salt electrodeposition, magnetron sputteringand chemical vapor deposition were also methods of preparing platinum composite electrode.

此外,铂电极复合方法还有熔盐电镀, 磁控溅射,化学气相沉积等,指出了各种方法的优缺点及发展方向.

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The influence of TiN thin flms grown processing by magnetron sputtering

磁控溅射制备TiN薄膜影响因素的研究

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