The sputtering rate increases with the increase of the cathode voltage and the temperature.
并且随着阴极温度升高,阴极溅射率也随之增加.
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采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.
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A new method, which synthesizes tantalum film by a sputtering cathode , has been introduced.
介绍了一种新型的在钢铁基体上制备钽薄膜的方法.
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It was also found that Ag is the preferential sputtering element for the AgNi alloys.
并发现该系统Ag是择优溅射元素.
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Technical manuals of a company: glass-sandblasting machine. Glass Sputtering Plant maintenance.
某公司技术操作手册: 玻璃喷砂机.
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Deposition rate is increase quickly with sputtering power.
结果表明溅射功率对沉积速率的影响最大,随溅射功率的增大沉积速率快速增大.
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With other global engines of growth sputtering, that's not to be sneezed at.
在全球其他经济增长引擎都运转不畅的情况下, 这一承诺不容小视.
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Reactive magnetic sputtering ( RMS ) is widely used in optical coating preparation.
反应 磁控溅射 广泛应用于制备光学薄膜.
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Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.
采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.
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The Application and Process of Three Pole Reaction Sputtering for Superhard Film
三极反应溅射超硬镀层工艺及其应用
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应用低能离子束辅助磁控溅射(IBAMS)沉积铬-铜-氮薄膜,研究了铜含量和轰击能量对薄膜结构、硬度和断裂韧度的影响。
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溅射法制备Y(Gd)Ba2Cu3O7高温超导薄膜工艺,膜的结构及超导性能研究
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Three pole reaction sputtering has the properties of simple equipment, easy process and fined film.
三极反应溅射具有设备简单,工艺简便,镀层致密等特点。
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